Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass

O'Neill, S.A. and Parkin, I.P. and Clark, R.J.H. and Elliott, N. and Mills, A. (2003) Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass. Journal of Materials Chemistry, 13 (1). pp. 56-60. ISSN 0959-9428 (http://www.rsc.org/delivery/_ArticleLinking/Displa...)

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Abstract

Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass substrates was achieved by the reaction of TiCl4 and a co-oxygen source (MeOH, EtOH, (PrOH)-Pr-i or H2O) at 500-650degreesC. The coatings show excellent uniformity, surface coverage and adherence. Growth rates were of the order of 0.3 mum min(-1) at 500degreesC. All films are crystalline and single phase with XRD showing the anatase TiO2 diffraction pattern; a = 3.78(1), c = 9.51(1) Angstrom. Optically, the films show minimal reflectivity from 300-1600 nm and 50-80% total transmission from 300-800 nm. Contact angles are in the range 20-40degrees for as-prepared films and 1-10degrees after 30 min irradiation at 254 nm. All of the films show significant photocatalyic activity as regards the destruction of an overlayer of stearic acid.

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