Dip-pen nanolithography of nanostructured oligofluorene truxenes in a photo-curable host matrix

Hernandez-Santana, Aaron and Mackintosh, Allan R. and Guilhabert, Benoit and Kanibolotsky, Alexander L. and Dawson, Martin D. and Skabara, Peter J. and Graham, Duncan (2011) Dip-pen nanolithography of nanostructured oligofluorene truxenes in a photo-curable host matrix. Journal of Materials Chemistry, 21 (37). pp. 14209-14212. ISSN 0959-9428 (https://doi.org/10.1039/c1jm11378j)

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Abstract

We report the controlled patterning of nano-sized oligofluorene truxenes onto silicon dioxide by dip-pen nanolithography (DPN) using a UV-curable pre-polymer as a carrier fluid. In this technique, a sharp atomic force microscope (AFM) cantilever tip is used to transfer the liquid ink onto a surface using piezo-controlled movements and excellent spatial registry. The photo-curable carrier fluid is then exposed to UV-light to produce a cross-linked, host matrix while retaining the photoluminescent properties of the truxenes and providing protection against photo-oxidation. The chemical composition of the composite structures deposited by DPN was characterised by Raman microspectroscopy and microphotoluminescence to demonstrate successful incorporation of the photoluminescent truxenes in the polymer matrix.

ORCID iDs

Hernandez-Santana, Aaron, Mackintosh, Allan R., Guilhabert, Benoit ORCID logoORCID: https://orcid.org/0000-0002-3986-8566, Kanibolotsky, Alexander L. ORCID logoORCID: https://orcid.org/0000-0003-3991-6297, Dawson, Martin D. ORCID logoORCID: https://orcid.org/0000-0002-6639-2989, Skabara, Peter J. and Graham, Duncan ORCID logoORCID: https://orcid.org/0000-0002-6079-2105;