Dip-pen nanolithography of nanostructured oligofluorene truxenes in a photo-curable host matrix

Hernandez-Santana, Aaron and Mackintosh, Allan R. and Guilhabert, Benoit and Kanibolotsky, Alexander L. and Dawson, Martin D. and Skabara, Peter J. and Graham, Duncan (2011) Dip-pen nanolithography of nanostructured oligofluorene truxenes in a photo-curable host matrix. Journal of Materials Chemistry, 21 (37). pp. 14209-14212. ISSN 0959-9428 (https://doi.org/10.1039/c1jm11378j)

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Abstract

We report the controlled patterning of nano-sized oligofluorene truxenes onto silicon dioxide by dip-pen nanolithography (DPN) using a UV-curable pre-polymer as a carrier fluid. In this technique, a sharp atomic force microscope (AFM) cantilever tip is used to transfer the liquid ink onto a surface using piezo-controlled movements and excellent spatial registry. The photo-curable carrier fluid is then exposed to UV-light to produce a cross-linked, host matrix while retaining the photoluminescent properties of the truxenes and providing protection against photo-oxidation. The chemical composition of the composite structures deposited by DPN was characterised by Raman microspectroscopy and microphotoluminescence to demonstrate successful incorporation of the photoluminescent truxenes in the polymer matrix.

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