Browse by Journal or other publication
![[up]](/style/images/multi_up.png)
Up a level2022
Yu, Nan and Reid, Stuart and Cheung, Rebecca and Koutsos, Vasileios (2022) Foreword to the special issue on nanomanufacturing and atomic & close-to-atomic scale manufacturing (ACSM). Nanomanufacturing and Metrology, 5 (3). pp. 189-190. ISSN 2520-8128
Gao, Jian and Luo, Xichun and Chang, Wenlong and Wang, Zhengjian and Yan, Yongda and Geng, Yanquan (2022) Insight into atomic-scale adhesion at the C-Cu interface during the initial stage of nanoindentation. Nanomanufacturing and Metrology, 5 (3). pp. 250-258. 6. ISSN 2520-8128
2021
Fan, Pengfei and Goel, Saurav and Luo, Xichun and Upadhyaya, Hari M (2021) Atomic scale friction studies on single crystal GaAs using AFM and molecular dynamics simulation. Nanomanufacturing and Metrology, 5 (1). pp. 39-49. ISSN 2520-8128
2020
Guo, Xiaoguang and Li, Ming and Luo, Xichun and Zhai, Ruifeng and Kang, Renke and Jin, Zhuji and Guo, Dongming (2020) Smoothed-particle hydrodynamics investigation on brittle–ductile transition of quartz glass in single-grain grinding process. Nanomanufacturing and Metrology, 3. pp. 299-306. ISSN 2520-8128
Fan, Pengfei and Ding, Fei and Luo, Xichun and Yan, Yongda and Geng, Yanquan and Wang, Yuzhang (2020) A simulated investigation of ductile response of GaAs in single point diamond turning and experimental validation. Nanomanufacturing and Metrology, 3 (4). pp. 239-250. ISSN 2520-8128
2019
Ding, Fei and Luo, Xichun and Chang, Wenlong and Wang, Zhengjian (2019) In situ measurement of spindle radial and tilt error motions by complementary multi-probe method. Nanomanufacturing and Metrology. ISSN 2520-8128
Cai, Yukui and Xu, Zongwei and Wang, Hong and Lau, King Hang Aaron and Ding, Fei and Sun, Jining and Qin, Yi and Luo, Xichun (2019) A sequential process for manufacturing nature-inspired anisotropic superhydrophobic structures on AISI 316L stainless steel. Nanomanufacturing and Metrology. ISSN 2520-8128
2018
Hasan, Rashed Md. Murad and Luo, Xichun (2018) Promising lithography techniques for next generation logic devices : a review. Nanomanufacturing and Metrology. ISSN 2520-8128