Design of a low-cost, high-precision rolling nanoelectrode lithography machine for manufacturing nanoscale products

Wang, Zhengjian and Luo, Xichun and Hasan, Rashed Md Murad and Xie, Wenkun and Chang, Wenlong and Liu, Qi (2024) Design of a low-cost, high-precision rolling nanoelectrode lithography machine for manufacturing nanoscale products. In: 24th Euspen International Conference & Exhibition, 2024-06-10 - 2024-06-14, University College Dublin.

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Abstract

This paper presents the design of a low-cost, high-precision rolling nanoelectrode lithography (RNEL) machine, addressing the growing demand for cost-effective and high-precision nanomanufacturing processes for next-generation nanoproducts. Unlike plate-to-plate methods, the rolling stamp ensures uniform contact pressure across the entire surface of the 8-inch substrates, simplifying the separation process. However, achieving precise positioning between the rolling stamp and substrate during RNEL operations is essential, as even slight deviations can lead to significant defects in fabricated nanostructures. This poses a considerable challenge in developing an affordable, high-precision RNEL machine that meets the requirements for high-yield production, especially for SMEs. The final design adopts a four-axis fixed-gantry configuration where the X- and Y-axes are mounted separately, chosen from four candidates for the superior overall performance. The machine employs a step-and-repeat mechanism using three low-cost ball-bearing linear slides. Additionally, a flexure-based passive tilting stage with nanometre resolution is integrated into the roller unit, promoting high alignment accuracy and uniform contact. In simulations, a 5 N load at the rolling stamp's edge causes a rotation of about 0.00022 radians with only a tiny lateral deformation of 4.9 nm. While the current design achieves an RSS error of approximately 10 μm, attaining the desired sub-micron positioning accuracy requires further developments, particularly in compensating for geometric and thermal errors. Addressing these issues is the next step in our research, aiming to fulfil the precision demands of RNEL operations.

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