Microscopy of defects in semiconductors

Massabuau, Fabien C.-P and Bruckbauer, Jochen and Trager-Cowan, Carol and Oliver, Rachel A; Tuomisto, Filip, ed. (2019) Microscopy of defects in semiconductors. In: Characaterisation and Control of Defects in Semiconductors. Materials, Circuits and Devices . IET, [S.I.]. ISBN 978-1-78561-655-6 (https://doi.org/10.1049/PBCS045E_ch8)

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In this chapter, the authors discuss microscopy techniques that can be useful in addressing defects in semiconductors. They focus on three main families: scanning probe microscopy, scanning electron microscopy and transmission electron microscopy. They first address the basic principles of the selected microscopy techniques In discussions of image formation, they elucidate the mechanisms by which defects are typically imaged in each technique. Then, in the latter part of the chapter, they describe some key examples of the application of microscopy to semiconductor materials, addressing both point and extended defects and both two-dimensional (2D) and three-dimensional (3D) materials.


Massabuau, Fabien C.-P ORCID logoORCID: https://orcid.org/0000-0003-1008-1652, Bruckbauer, Jochen ORCID logoORCID: https://orcid.org/0000-0001-9236-9320, Trager-Cowan, Carol ORCID logoORCID: https://orcid.org/0000-0001-8684-7410 and Oliver, Rachel A; Tuomisto, Filip