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Evidence of high-n hollow ion emission from Si ions pumped by ultraintense x-rays from relativistic laser plasma

Colgan, J. and Faenov, A. Ya and Pikuz, S. A. and Tubman, E. and Butler, N. M. H. and Abdallah Jr, J. and Pikuz, T. A. and Skobelev, I. Yu. and Alkhimova, M. A. and Booth, N. and Green, J. and Gregory, C. and Andreev, A. and Lotzsch, R and Uschmann, I. and Zhidkov, A. and Kodama, R. and Woolsey, N. (2016) Evidence of high-n hollow ion emission from Si ions pumped by ultraintense x-rays from relativistic laser plasma. EPL: A Letters Journal Exploring the Frontiers of Physics, 114 (3). ISSN 0295-5075

Text (Colgan-etal-EPL-2016-Evidence-of-high-n-hollow-ion-emission-from-Si-ions)
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    We report on the first observation of high-n hollow ions (ions having no electrons in the K or L shells) produced in Si targets via pumping by ultra-intense x-ray radiation produced in intense laser-plasma interactions reaching the radiation dominant kinetics regime. The existence of these new types of hollow ions in high energy density plasma has been found via observation of highly-resolved x-ray emission spectra of silicon plasma, and confirmed by plasma kinetics calculations, underscoring the ability of powerful radiation sources to fully strip electrons from the inner-most shells of light atoms. Hollow ions spectral diagnostics provide a unique opportunity to characterize powerful x-ray radiation of laboratory and astrophysical plasmas.