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Determination of Ga auto-incorporation in nominal InAlN epilayers grown by MOCVD

Smith, M. D. and Taylor, E. and Sadler, T. C. and Zubialevich, V. Z. and Lorenz, K. and Li, H. N. and O'Connell, J. and Alves, E. and Holmes, J. D. and Martin, R. W. and Parbrook, P. J. (2014) Determination of Ga auto-incorporation in nominal InAlN epilayers grown by MOCVD. Journal of Materials Chemistry. C, 2 (29). pp. 5787-5792. ISSN 2050-7526

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We report on the consistent measurement of gallium incorporation in nominal InAlN layers using various complimentary techniques, underpinned by X-ray diffraction. Nominal InAlN layers with similar growth conditions were prepared, and the change in unintended Ga content in the group III sublattice ranged from similar to 24% to similar to 12% when the total reactor flow rate was increased from 8000 to 24 000 standard cubic centimetres per minute. Ultra-thin InAlN/GaN HEMT layers were grown in a clean reactor to minimize Ga auto-incorporation, and measured using X-ray photoelectron spectroscopy and secondary ion mass spectrometry. The implications of Ga incorporation in InAlN layers within optoelectronic and power devices is discussed.