Novel TiO2 CVD films for semiconductor photocatalysis

Mills, A. and Elliott, N. and Parkin, I.P. and O'Neill, S.A. and Clark, R.J. (2002) Novel TiO2 CVD films for semiconductor photocatalysis. Journal of Photochemistry and Photobiology A: Chemistry, 151 (1-3). pp. 171-179. ISSN 1010-6030 (https://doi.org/10.1016/S1010-6030(02)00190-9)

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Abstract

A novel CVD film of titanium(IV) oxide has been prepared on glass, via the reaction of titanium(IV) chloride and ethyl acetate, using a CVD technique. The film is clear, very robust mechanically and comprised of a thin (24 nm) layer of nanocrystalline anatase titania that absorbs light of lambda < 360 nm. The film is active in terms of photo-induced superhydrophilicity, and thus its water contact angle is reduced markedly (from 61 to 11degrees) upon irradiation with ultra-bandgap light. The film is also active photocatalytically and is able to destroy a deposited layer of stearic acid upon exposure to ultra-bandgap light. The photo-induced superhydrophilic and photocatalytic activities of this film are compared with those for one comprised of P25 particles.

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