Comparison of conventional and maskless lithographic techniques for More than Moore post-processing of foundry CMOS chips
Tsiamis, Andreas and Li, Yifan and Dunare, Camelia and Marland, Jamie R.K. and Blair, Ewen O. and Smith, Stewart and Terry, Jonathan G. and Mitra, Srinjoy and Underwood, Ian and Murray, Alan F. and Walton, Anthony J. (2020) Comparison of conventional and maskless lithographic techniques for More than Moore post-processing of foundry CMOS chips. Journal of Microelectromechanical Systems, 29 (5). pp. 1245-1252. 9173531. ISSN 1057-7157 (https://doi.org/10.1109/JMEMS.2020.3015964)
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Abstract
This article details and compares the technology options for post-processing foundry produced CMOS at chip-scale to enable More than Moore functionality. In many cases there are attractions in using chip-based processing through the Multi-Project Wafer route that is frequently employed in research, early-stage development and low-volume production. This article identifies that spray-based photoresist deposition combined with optical maskless lithography demonstrates sufficient performance combined with low cost and operational convenience to offer an attractive alternative to conventional optical lithography, where spin-coated photoresist is exposed through a patterned photomask.
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Item type: Article ID code: 77259 Dates: DateEvent1 October 2020Published21 August 2020Published Online6 August 2020AcceptedNotes: © 2020 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting /republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works. Subjects: Technology > Engineering (General). Civil engineering (General) > Bioengineering Department: Faculty of Engineering > Biomedical Engineering Depositing user: Pure Administrator Date deposited: 02 Aug 2021 15:56 Last modified: 25 Jun 2024 01:42 Related URLs: URI: https://strathprints.strath.ac.uk/id/eprint/77259