Nanolithography : status and challenges

Tools

Hasan, Rashed Md. Murad and Luo, Xichun; (2017) Nanolithography : status and challenges. In: 23rd International Conference on Automation and Computing (ICAC). IEEE, GBR. ISBN 9780701702601 (https://doi.org/10.23919/IConAC.2017.8081979)

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Abstract

With the help of immersion lithography and multiple patterning, photolithography has been the key technology over the last decade in manufacturing of ICs, microchips and MEMS devices. Continuous rapid shrinking of feature size made the authorities to seek alternative patterning methods that can go beyond classic photographic limits. Some promising techniques have been proposed as next generation lithography and further technological progress are required to make them significant and reliable to meet the current demand. EUVL is considered as the main candidate for sub-10 nm manufacturing because of its process simplicity and reduced operating cost. Remarkable progress in EUVL has been made and the tools will be available for commercial operation soon. EBL, FIB and X-ray lithography are used for patterning in R&D, mask/mold fabrication and low volume chip design. DSA have already been realized in lab and further effort will be needed to make it as NGL solution. NIL has emerged attractively due to its simple process-steps, high-throughput, high-resolution and low cost and become one of the commercial platforms for nanofabrication.

ORCID iDs

Hasan, Rashed Md. Murad and Luo, Xichun ORCID logoORCID: https://orcid.org/0000-0002-5024-7058;
  • Item type:Book Section
    ID code:64171
    Dates:
    Date
    Event
    26 October 2017
    Published
    14 June 2017
    Accepted
    Notes:© 2017 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting /republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.
    Subjects:Technology > Electrical engineering. Electronics Nuclear engineering
    Department:Faculty of Engineering > Design, Manufacture and Engineering Management
    Depositing user: Pure Administrator
    Date deposited:25 May 2018 15:39
    Last modified:11 Nov 2024 15:14
    Related URLs:
    URI:https://strathprints.strath.ac.uk/id/eprint/64171
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