Friction, nanowear and corrosion properties of electroplated Nickel surfaces after dual implantation of Cr+ and N2+ ions : Influence of the implantation energy of the N2+ ions

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Muñoz-García, C and Conde, A and Garcia, I and Fuentes, G.G. and Almandoz, E. and García, J.A. and Rodríguez, R.J. and Qin, Yi (2012) Friction, nanowear and corrosion properties of electroplated Nickel surfaces after dual implantation of Cr+ and N2+ ions : Influence of the implantation energy of the N2+ ions. Surface and Coatings Technology, 210. pp. 46-53. ISSN 0257-8972 (https://doi.org/10.1016/j.surfcoat.2012.08.062)

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Abstract

In this work, dual implantation of Cr+ and N2+ ions on electroplated Ni substrates have been investigated for N2+ implantation energies of 140 keV, 100 keV and 60 keV. The implanted specimens have been analyzed by glow discharge optical emission spectroscopy, X-ray diffraction, nano-indentation, coefficient of friction, nano-wear and potentiodynamic corrosion curves. The properties of the dual implanted samples have been compared to Cr+ or N2+ implanted specimens. The microstructural and mechanical properties of the Ni plates depend on the penetration ranges of the Cr and N atomic profiles obtained after the implantation process. The increase of hardness reduced the coefficient of friction of the samples and the wear rates. Preferential formation of Cr–N over Ni–N compounds has been observed when the Cr and N atomic profiles coexist within the Ni matrix. The potentiodynamic corrosion curves in acidic solutions revealed that the presence of Me–N species is detrimental for the chemical stability of the plates. Both nano-wear and corrosion properties are optimized when a Ni–N sublayer is formed underneath a top Cr–Ni implanted film. This is achieved by tuning the implantation energies of Cr+ and N2+ ions at 140 keV. This bilayer structure could be a suitable treatment for micro-embossing dies for plastic texturing processes.

ORCID iDs

Muñoz-García, C, Conde, A, Garcia, I, Fuentes, G.G., Almandoz, E., García, J.A., Rodríguez, R.J. and Qin, Yi ORCID logoORCID: https://orcid.org/0000-0001-7103-4855;
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