Direct adsorption and monolayer self-assembly of acetyl-protected dithiols : Langmuir

Lau, K. H. A. and Huang, C. and Yakovlev, N. and Chen, Z. K. and O'Shea, S. J. (2006) Direct adsorption and monolayer self-assembly of acetyl-protected dithiols : Langmuir. Langmuir, 22 (7). pp. 2968-2971. ISSN 0743-7463 (https://doi.org/10.1021/la053248g)

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Abstract

The alpha,omega-dithiols, with sulfur-containing groups at both ends of the molecules, can be used to bridge a metallic gap. Functional self-assembled monolayers (SAMs) of these dithiols must "stand up" on the surface and expose one thiol group for further reaction. However, both parallel and upright surface orientations and multilayer formation can occur for alpha,omega-dithiols. We find SAMs deposited directly from acetyl protected dithiols (i.e., with no de-protection step) overcome these problems. We present a systematic study of adsorption kinetics from in situ surface plasmon resonance spectroscopy, X-ray photoelectron spectroscopy, and secondary ion mass spectroscopy of alkane- and oligo(phenylene ethylnylene)-based alpha,omega-dithioacetates on gold.

ORCID iDs

Lau, K. H. A. ORCID logoORCID: https://orcid.org/0000-0003-3676-9228, Huang, C., Yakovlev, N., Chen, Z. K. and O'Shea, S. J.;