Large cross-section edge-coupled diamond waveguides

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Zhang, Yanfeng and McKnight, Loyd and Tian, Zhaoshuo and Calvez, Stephane and Gu, Erdan and Dawson, Martin D. (2011) Large cross-section edge-coupled diamond waveguides. Diamond and Related Materials, 20 (4). pp. 564-567. ISSN 0925-9635 (https://doi.org/10.1016/j.diamond.2011.03.002)

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Abstract

A new approach to fabricate large cross-section edge-coupled waveguides on free-standing thin diamond substrates is reported. Combining inkjet printing of photoresist multilayers with photolithographic patterning, both edge and 'coffee stain' effects were successfully eliminated, allowing the fabrication of well-defined, millimetre-scale uniform photoresist micro-stripes which extend to the very edge of the diamond substrate. Subsequent transfer of these micro-stripe structures into diamond by inductively coupled plasma (ICP) etching allowed long edge-coupled waveguides in diamond to be made. Guided wave propagation in these diamond waveguides was also confirmed. (C) 2011 Elsevier B.V. All rights reserved.

ORCID iDs

Zhang, Yanfeng, McKnight, Loyd, Tian, Zhaoshuo, Calvez, Stephane, Gu, Erdan ORCID logoORCID: https://orcid.org/0000-0002-7607-9902 and Dawson, Martin D. ORCID logoORCID: https://orcid.org/0000-0002-6639-2989;
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