Comparison of conventional and maskless lithographic techniques for More than Moore post-processing of foundry CMOS chips

Tsiamis, Andreas and Li, Yifan and Dunare, Camelia and Marland, Jamie R.K. and Blair, Ewen O. and Smith, Stewart and Terry, Jonathan G. and Mitra, Srinjoy and Underwood, Ian and Murray, Alan F. and Walton, Anthony J. (2020) Comparison of conventional and maskless lithographic techniques for More than Moore post-processing of foundry CMOS chips. Journal of Microelectromechanical Systems, 29 (5). pp. 1245-1252. 9173531. ISSN 1057-7157 (https://doi.org/10.1109/JMEMS.2020.3015964)

[thumbnail of Tsiamis-etal-2020-Comparison-of-conventional-and-maskless-lithographic-techniques-for-More-than-Moore]
Preview
 Text. Filename: Tsiamis_etal_2020_Comparison_of_conventional_and_maskless_lithographic_techniques_for_More_than_Moore.pdf
Accepted Author Manuscript
Download (8MB)| Preview

Abstract

This article details and compares the technology options for post-processing foundry produced CMOS at chip-scale to enable More than Moore functionality. In many cases there are attractions in using chip-based processing through the Multi-Project Wafer route that is frequently employed in research, early-stage development and low-volume production. This article identifies that spray-based photoresist deposition combined with optical maskless lithography demonstrates sufficient performance combined with low cost and operational convenience to offer an attractive alternative to conventional optical lithography, where spin-coated photoresist is exposed through a patterned photomask.

ORCID iDs

Tsiamis, Andreas, Li, Yifan, Dunare, Camelia, Marland, Jamie R.K., Blair, Ewen O. ORCID logoORCID: https://orcid.org/0000-0002-1887-8001, Smith, Stewart, Terry, Jonathan G., Mitra, Srinjoy, Underwood, Ian, Murray, Alan F. and Walton, Anthony J.;
  • Item type:Article
    ID code:77259
    Dates:
    Date
    Event
    1 October 2020
    Published
    21 August 2020
    Published Online
    6 August 2020
    Accepted
    Notes:© 2020 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting /republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.
    Subjects:Technology > Engineering (General). Civil engineering (General) > Bioengineering
    Department:Faculty of Engineering > Biomedical Engineering
    Depositing user: Pure Administrator
    Date deposited:02 Aug 2021 15:56
    Last modified:11 Nov 2024 13:10
    Related URLs:
    URI:https://strathprints.strath.ac.uk/id/eprint/77259
CORE (COnnecting REpositories)