Digital illumination in microscale direct-writing photolithography : challenges and trade-off

Stonehouse, Mark and Zhang, Yanchao and Guilhabert, Benoit and Watson, Ian and Gu, Erdan and Herrnsdorf, Johannes and Dawson, Martin (2018) Digital illumination in microscale direct-writing photolithography : challenges and trade-off. In: IEEE British and Irish Conference on Optics and Photonics, 2018-12-12 - 2018-12-14.

[img]
Preview
Text (Stonehouse-etal-IEEE-BICOP-2018-Digital-illumination-in-microscale-direct-writing-photolithography)
Stonehouse_etal_IEEE_BICOP_2018_Digital_illumination_in_microscale_direct_writing_photolithography.pdf
Accepted Author Manuscript

Download (3MB)| Preview

    Abstract

    We explore the adaptation of existing photolithography technologies and introduce the potential for additional functionality in the form of structured light. By using a complementary metal oxide semiconductor (CMOS) controlled micropixellated light emitting diode (LED) array, features such as object recognition, tracking and characterization are possible in combination with photo-curing. We discuss the observed trade off between the delivered power density and resolution capability of the system due to the requirements of the additional features.