Hydroxyl radicals and hydrogen peroxide formation at nonthermal plasma-water interface

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Zhao, Yi Yi and Wang, Tao and Wilson, Mark P. and MacGregor, Scott J. and Timoshkin, Igor V. and Ren, Qing Chun (2016) Hydroxyl radicals and hydrogen peroxide formation at nonthermal plasma-water interface. IEEE Transactions on Plasma Science, 44 (10). 2084 - 2091. ISSN 1939-9375 (https://doi.org/10.1109/TPS.2016.2547841)

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Abstract

This paper investigated hydroxyl radicals and hydrogen peroxide formation under a needle-plate electrode con- figuration using positive-polarity dc discharges generated in air, nitrogen, and helium. The discharge mode in air and nitrogen was found to change above ultrapure water; initially, a nanosecond pulse discharge was observed, transitioning to a diffuse discharge due to the increasing conductivity of the water. The discharge in helium was a nanosecond pulse discharge and the repetition rate increased with increasing water conductivity. It was found that hydroxyl radicals contribute to 7%, 78%, and 70% of hydrogen peroxide formation when using the ultrapure water in air, nitrogen, and helium, respectively. It is suggested that hydroxyl radicals are formed by water reactions with energetic positive ions and the neutral particles, such as N + 2 ,He + ,O,H, and HO 2 . Part of hydrogen peroxide is directly formed from atoms and radical reactions with water in nitrogen and helium, while oxygen reactions are heavily involved for hydrogen peroxide formation in air. A fluorophotometry method, using terephthalic acid, was used to directly quantify the formation of hydroxyl radicals and compared with the tert-butanol method.

ORCID iDs

Zhao, Yi Yi ORCID logoORCID: https://orcid.org/0000-0002-7728-553X, Wang, Tao ORCID logoORCID: https://orcid.org/0000-0003-3054-0772, Wilson, Mark P. ORCID logoORCID: https://orcid.org/0000-0003-3088-8541, MacGregor, Scott J. ORCID logoORCID: https://orcid.org/0000-0002-0808-585X, Timoshkin, Igor V. ORCID logoORCID: https://orcid.org/0000-0002-0380-9003 and Ren, Qing Chun;
  • Item type:Article
    ID code:56691
    Dates:
    Date
    Event
    31 October 2016
    Published
    11 March 2016
    Accepted
    Notes:(c) 2016 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other users, including reprinting/ republishing this material for advertising or promotional purposes, creating new collective works for resale or redistribution to servers or lists, or reuse of any copyrighted components of this work in other works.
    Subjects:Technology > Electrical engineering. Electronics Nuclear engineering
    Department:Faculty of Engineering > Electronic and Electrical Engineering
    Depositing user: Pure Administrator
    Date deposited:17 Jun 2016 13:12
    Last modified:22 Dec 2024 01:17
    URI:https://strathprints.strath.ac.uk/id/eprint/56691
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