Thick titanium dioxide films for semiconductor photocatalysis

Mills, Andrew and Hill, George and Bhopal, Sharan and Parkin, Ivan P. and O'Neill, Shane (2003) Thick titanium dioxide films for semiconductor photocatalysis. Journal of Photochemistry and Photobiology A: Chemistry, 160 (3). pp. 185-194. ISSN 1010-6030 (http://dx.doi.org/10.1016/S1010-6030(03)00206-5)

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Abstract

Thick paste TiO2 films are prepared and tested for photocatalytic and photoinduced superhydrophilic (PSH) activity. The films are effective photocatalysts for the destruction of stearic acid using near or far UV and all the sol-gel films tested exhibited a quantum yield for this process of typically 0.15%. These quantum yields are significantly greater (4-8-fold) than those for titania films produced by an APCVD technique, including the commercial self-cleaning glass product Activ™. The films are mechanically robust and optically clear and, as photocatalysts for stearic acid removal, are photochemically stable and reproducible. The kinetics of stearic acid photomineralisation are zero order with an activation energy of ca. 2.5 kJ mol−1. All titania films tested, including those produced by APCVD, exhibit PSH. The light-induced fall, and dark recovery, in the water droplet contact angle made with titania paste films are similar in profile shape to those described by others for thin titania films produced by a traditional sol-gel route.

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