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Properties of semiconductor surfaces covered with very thin insulating overlayers prepared by impacts of low-energy particles

Pincik, E. and Gleskova, H. and Mullerova, J. and Nadazdy, V. and Mraz, S. and Ortega, L. and Jergel, M. and Falcony, C. and Brunner, R. and Gmucova, K. and Zeman, M. and van Swaaij, R. A. C. M. M. and Kucera, M. and Jurani, R. and Zahoran, M. (2002) Properties of semiconductor surfaces covered with very thin insulating overlayers prepared by impacts of low-energy particles. Vacuum, 67 (1). pp. 131-141. ISSN 0042-207X

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This paper deals with the formation of very thin insulating layers on crystalline (GaAs) and amorphous semiconductors (a-Si:H and a-SiGe:H) prepared by the impacts of particles of a very low energy. Plasma, ion beams and plasma immersion ion implantation (PIII) as the sources of impacting particles were used and compared. The last technique was applied successfully for the first time in the case of amorphous silicon-based semiconductors. More diagnostics techniques were used for the investigation of the transformation of the semiconductor surface properties. In the a-Si:H based MOS structures prepared by PIII technology, only two groups of defects 0.82 and 1.25 eV (D(z) and D(e), respectively) were found. We suppose that the PIII technology using the implantation at the sample voltage of ca. -1000V causes the formation of a-Si:H layers with missing group of D(h) states. The only decisive parameter determining the formation of two groups of states is the negative potential of the sample during the implantation. In aSiGe:H based MOS structures, three distributions could be prepared by a bias annealing procedure: 0.47, 0.58 and 0.95 eV corresponding to p-type (D(h)) intrinsic (D(z)) and n-type (D(e)) distributions, respectively.