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Open Access research with a European policy impact...

The Strathprints institutional repository is a digital archive of University of Strathclyde's Open Access research outputs. Strathprints provides access to thousands of Open Access research papers by Strathclyde researchers, including by researchers from the European Policies Research Centre (EPRC).

EPRC is a leading institute in Europe for comparative research on public policy, with a particular focus on regional development policies. Spanning 30 European countries, EPRC research programmes have a strong emphasis on applied research and knowledge exchange, including the provision of policy advice to EU institutions and national and sub-national government authorities throughout Europe.

Explore research outputs by the European Policies Research Centre...

Tapered sidewall dry etching process for GaN and its applications in device fabrication

Choi, H.W. and Jeon, C.W. and Dawson, M.D. (2005) Tapered sidewall dry etching process for GaN and its applications in device fabrication. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 23 (1). pp. 99-102. ISSN 1071-1023

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Abstract

A method of etching which allows the direct interconnection of multiple GaN-based devices is introduced. The mesa structures of devices are etched using an isotropic recipe which produces tapered sidewalls. The degree of inclination can be readily controlled through various etching parameters, which include the inductively coupled plasma power, plate power, and pressure, thus modifying the vertical and lateral etch components. This approach has been successfully adopted in the fabrication of interconnected and matrix-addressable microlight-emitting diodes, and offers superior optical and electrical performance and a high degree of uniformity compared to similar devices fabricated using conventional processes.