Selected techniques for examining the electrical, optical and spatial properties of extended defects in semiconductors
Boyall, N.M. and Durose, K. and Liu, T.Y. and Trampert, A. and Liu, C. and Watson, I.M. (2003) Selected techniques for examining the electrical, optical and spatial properties of extended defects in semiconductors. Institute of Physics Conference Series, 179 (2). pp. 61-66. ISSN 0951-3248
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Three methods in semiconductor defect analysis are described with examples and appraisal of their capbilities; an electron beam induced current method (R-EBIC) is shown to determine the sense of band bending at grain boundaries in the CdTe-CdS system. Cathodoluminescence in the TEM has demonstrated a link between stacking faults and 3.26eV luminescence in GaN. Statistical analysis of spatial pattern appolied to 'v-pit' distributions in InGaN structures on sapphire demonstrates the pits to be correlatied on the scale of 60-120nm.
ORCID iDs
Boyall, N.M., Durose, K., Liu, T.Y., Trampert, A., Liu, C. and Watson, I.M. ORCID: https://orcid.org/0000-0002-8797-3993;-
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Item type: Article ID code: 5251 Dates: DateEvent2003PublishedNotes: Paper presented at Electron Microscopy and Analysis Group Conference, Oxford, 2003. Subjects: Science > Physics > Optics. Light
Technology > Electrical engineering. Electronics Nuclear engineeringDepartment: Faculty of Science > Physics > Institute of Photonics Depositing user: Strathprints Administrator Date deposited: 30 Jan 2008 Last modified: 11 Nov 2024 08:39 URI: https://strathprints.strath.ac.uk/id/eprint/5251