Gold nanoparticle patterning of silicon wafers using chemical e-beam lithography

Chen, Y. and Mendes, P.M. and Jacke, S. and Critchley, K. and Plaza, J. and Nikitin, K. and Palmer, R.E. and Preece, J.A. and Evans, S.D. and Fitzmaurice, D. (2004) Gold nanoparticle patterning of silicon wafers using chemical e-beam lithography. Langmuir, 20 (9). pp. 3766-3768. ISSN 0743-7463 (http://dx.doi.org/10.1021/la049803g)

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Abstract

This paper demonstrates a novel facile method for fabrication of patterned arrays of gold nanoparticles on Si/SiO2 by combining electron beam lithography and self-assembly techniques. Our strategy is to use direct-write electron beam patterning to convert nitro functionality in self-assembled monolayers of 3-(4-nitrophenoxy)-propyltrimethoxysilane to amino functionality, forming chemically well-defined surface architectures on the 100 nm scale. These nanopatterns are employed to guide the assembly of citrate-passivated gold nanoparticles according to their different affinities for amino and nitro groups. This kind of nanoparticle assembly offers an attractive new option for nanoparticle patterning a silicon surface, as relevant, for example, to biosensors, electronics, and optical devices.

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