Picture of boy being examining by doctor at a tuberculosis sanatorium

Understanding our future through Open Access research about our past...

Strathprints makes available scholarly Open Access content by researchers in the Centre for the Social History of Health & Healthcare (CSHHH), based within the School of Humanities, and considered Scotland's leading centre for the history of health and medicine.

Research at CSHHH explores the modern world since 1800 in locations as diverse as the UK, Asia, Africa, North America, and Europe. Areas of specialism include contraception and sexuality; family health and medical services; occupational health and medicine; disability; the history of psychiatry; conflict and warfare; and, drugs, pharmaceuticals and intoxicants.

Explore the Open Access research of the Centre for the Social History of Health and Healthcare. Or explore all of Strathclyde's Open Access research...

Image: Heart of England NHS Foundation Trust. Wellcome Collection - CC-BY.

Sub-micron lithography using InGaN micro-LEDs : mask-free fabrication of LED arrays

Guilhabert, Benoit Jack Eloi and Massoubre, David and Richardson, Elliot and McKendry, Jonathan and Valentine, Gareth and Henderson, Robert and Watson, Ian and Gu, Erdan and Dawson, Martin (2012) Sub-micron lithography using InGaN micro-LEDs : mask-free fabrication of LED arrays. IEEE Photonics Technology Letters, 24 (24). pp. 2221-2224. ISSN 1041-1135

Full text not available in this repository. Request a copy from the Strathclyde author


The fabrication of gallium-nitride (GaN)-based light-emitting diode (LED) arrays by a direct writing technique, itself using micron-sized LEDs (micro-LEDs), is reported. CMOSdriven ultraviolet GaN-based micro-LED arrays are used to pattern photoresist layers with feature sizes as small as 500 nm. Checkerboard-type square LED array devices are then fabricated using such photoresist patterns based on either single pixel or multipixel direct writing, and implemented as part of a completely mask-less process flow. These exemplar arrays are composed of either 450-nm-emitting 199 × 199 μm2 pixels on a 200-μm pitch or 520-nm-emitting 21 × 18 μm2 pixels on a 23-μm pitch. Fill factors of 99% and 71.5% are achieved with optical output power densities per pixel of 5 and 20 W/cm2 at 90- and 6-mA dc-injected currents, respectively.