Amorphous silicon thin film transistor backplanes fabricated at high temperature for flexible displays

Cheng, I. C. and Wagner, S. and Kattamis, A. Z. and Hekmatshoar, B. and Cherenack, K. H. and Gleskova, Helena and Sturm, J. C.; Chen, C. H. and Tsai, Y. S., eds. (2007) Amorphous silicon thin film transistor backplanes fabricated at high temperature for flexible displays. In: IDMC ‘07. UNSPECIFIED, TWN, pp. 311-314.

Abstract

This chapter looks at amorphous silicon thin film transistor backplanes fabricated at high temperature for flexible displays

ORCID iDs

Gleskova, Helena ORCID: https://orcid.org/0000-0001-7195-9639

• Share and Export
  

  EP3 XMLRIS (EndNote Online, Zotero, Ref manager, etc)RIOXX2 XMLBibTeXMODSRefWorksSimple MetadataEndNoteMETSRDF+XMLASCII CitationHTML CitationOpenURL ContextObject in SpanRDF+N-TriplesMPEG-21 DIDLRDF+N3Multiline CSVJSONDublin CoreData Cite XMLAtomOpenURL ContextObjectRefer
• Item metadata

  Item type:	Book Section
  ID code:	33443
  Dates:	Date Event 2007 Published
  Subjects:	Technology > Electrical engineering. Electronics Nuclear engineering
  Department:	Faculty of Engineering > Electronic and Electrical Engineering
  Depositing user:	Pure Administrator
  Date deposited:	04 Nov 2011 16:43
  Last modified:	11 Nov 2024 14:44
  URI:	https://strathprints.strath.ac.uk/id/eprint/33443