Lattice site location of optical centers in GaN : Eu light emitting diode material grown by organometallic vapor phase epitaxy

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Lorenz, K. and Alves, E. and Roqan, I. S. and O'Donnell, K. P. and Nishikawa, A. and Fujiwara, Y. and Bockowski, M. (2010) Lattice site location of optical centers in GaN : Eu light emitting diode material grown by organometallic vapor phase epitaxy. Applied Physics Letters, 97 (11). p. 111911. ISSN 0003-6951 (https://doi.org/10.1063/1.3489103)

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Abstract

Eu-doped GaN was grown by organometallic vapor phase epitaxy at temperatures from 900 to 1100 degrees C. Eu incorporation is influenced by temperature with the highest concentration found for growth at 1000 degrees C. In all samples, Eu is incorporated entirely on substitutional Ga sites with a slight displacement which is highest (similar to 0.2 angstrom) in the sample grown at 900 degrees C and mainly directed along the c-axis. The major optical Eu3+ centers are identical for in situ doped and ion-implanted samples after high temperature and pressure annealing. The dominant Eu3+ luminescence lines are attributed to isolated, substitutional Eu. (c) 2010 American Institute of Physics. [doi:10.1063/1.3489103]

ORCID iDs

Lorenz, K., Alves, E., Roqan, I. S., O'Donnell, K. P. ORCID logoORCID: https://orcid.org/0000-0003-3072-3675, Nishikawa, A., Fujiwara, Y. and Bockowski, M.;
  • Item type:Article
    ID code:30172
    Dates:
    Date
    Event
    13 September 2010
    Published
    Subjects:Science > Physics
    Department:Faculty of Science > Physics
    Depositing user: Pure Administrator
    Date deposited:29 Mar 2011 15:10
    Last modified:22 Nov 2024 04:32
    Related URLs:
    URI:https://strathprints.strath.ac.uk/id/eprint/30172
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