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Atmospheric pressure chemical vapour deposition of thin films of Nb2O5 on glass

O'Neill, S.A. and Parkin, I.P. and Clark, R.J.H. and Mills, A. and Elliott, N. (2003) Atmospheric pressure chemical vapour deposition of thin films of Nb2O5 on glass. Journal of Materials Chemistry, 13 (12). pp. 2952-2956. ISSN 0959-9428

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Abstract

A novel route involving atmospheric pressure chemical vapour deposition (APCVD) is reported for coating Nb2O5 onto glass substrates via the reaction of NbCl5 and ethyl acetate at 400-660degreesC. Raman spectroscopy is shown to be a simple diagnostic tool for the analysis of these thin films. The contact angle of water on Nb2O5-coated glass drops on UV irradiation from 60degrees to 5-20degrees. XPS Analysis showed that the Nb:O ratio of the film was 1:2.5. Glancing angle X-ray diffraction showed that all films were crystalline, with only a single phase being observed; this has some preferred orientation in the (201) plane of Nb2O5. The niobium(V) oxide materials show minimal photocatalytic ability to degrade organic material.

Item type: Article
ID code: 436
Keywords: NIOBIUM OXIDE CATALYSTS, SOL-GEL PROCESS, COATINGS, PRECURSORS, OXIDATION, TANTALUM, DEVICES, RAMAN, Chemistry, Materials Chemistry, Chemistry(all)
Subjects: Science > Chemistry
Department: Faculty of Science > Pure and Applied Chemistry
Related URLs:
    Depositing user: Mr Derek Boyle
    Date Deposited: 10 Mar 2006
    Last modified: 04 Sep 2014 11:42
    URI: http://strathprints.strath.ac.uk/id/eprint/436

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