Extended X-ray absorption fine structure studies of GaN epilayers doped with Er

Katchkanov, V and Mosselmans, J F W and O'Donnell, K P and Nogales, E and Hernandez, S and Martin, R W and Steckl, A and Lee, D S (2006) Extended X-ray absorption fine structure studies of GaN epilayers doped with Er. Optical Materials, 28 (6-7). pp. 785-789. (https://doi.org/10.1016/j.optmat.2005.09.023)

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Abstract

The structural properties of Er doped GaN epilayers were studied by means of extended X-ray absorption fine structure (EXAFS) measured at the Er L-III and Ga K-edges. The samples were doped with Er in-situ during growth by molecular beam epitaxy (MBE). The Ga local structure was found to be the same in all samples studied. Er L-III-edge EXAFS showed that when growth conditions were gradually changed from Ga-rich to Ga-poor, an increase in Er concentration from 0.15 at.% to 0.64 at.% is accompanied by the sequential formation of ErGaN, ErGaN clusters with locally high Er content and finally a pure ErN component. This study indicates that Er incorporation into GaN is enhanced under Ga-poor conditions, at the expense of the formation of Er-rich clusters and ErN precipitates. (c) 2005 Elsevier B.V. All rights reserved.

ORCID iDs

Katchkanov, V, Mosselmans, J F W, O'Donnell, K P ORCID logoORCID: https://orcid.org/0000-0003-3072-3675, Nogales, E, Hernandez, S, Martin, R W ORCID logoORCID: https://orcid.org/0000-0002-6119-764X, Steckl, A and Lee, D S;
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