Advanced electrical and thermal scanning probe lithography for next-generation nanodevice fabrication

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Gao, Jian and Xie, Wenkun and Luo, Xichun (2025) Advanced electrical and thermal scanning probe lithography for next-generation nanodevice fabrication. Proceedings of SPIE - The International Society for Optical Engineering, 13427. 1342703. ISSN 1996-756X (https://doi.org/10.1117/12.3049277)

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Abstract

Scanning probe lithography (SPL) offers a variety of physical and chemical techniques for surface modification, enabling the fabrication of customized, functional nanoscale features. These methods provide unmatched resolution, repeatability, and operational simplicity compared to other lithographic techniques. This paper reviews recent advancements in SPL driven by electrical and thermal effects, highlighting how these approaches address the fabrication of functional nanostructures. These advancements pave the way for next-generation nanotechnological applications, including single-dopant atomic devices, memristors, metasurfaces, nanofluidic devices, and more.

ORCID iDs

Gao, Jian ORCID logoORCID: https://orcid.org/0000-0001-7740-5274, Xie, Wenkun ORCID logoORCID: https://orcid.org/0000-0002-5305-7356 and Luo, Xichun ORCID logoORCID: https://orcid.org/0000-0002-5024-7058;
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