Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz

Xie, Jie and Yin, H. and Zhang, L. and Ronald, Kevin and Phelps, A.D.R. and He, W. and Shu, G. and Zhao, J. and Chen, X. and Alfadhl, Y. and Zhang, J. and Cross, A.W. (2019) Effects of tolerance fabrication of extended interaction oscillator based on pseudospark-sourced sheet electron beam at 0.35 THz. In: 12th UK-Europe-China Workshop on Millimetre Waves and THz Technologies (UCMMT 2019), 2019-08-20 - 2019-08-22, Queen Mary University of London.

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    Abstract

    A practical numerical approach to the analysis of the effects of tolerances fabrication on the performance of a planar 0.35 THz extended interaction oscillator (EIO) is presented. The planar EIO is to be driven by pseudosparksourced sheet electron beam. The influence of tolerance on the Q-value, resonance frequency, characteristic impedance is demonstrated using an effective value of conductivity of 1.1 x 1E7 S/m to take into account the skin depth and surface roughness. The method of Wire Electrical Discharge Machining (WEDM) is proposed to manufacture the 0.35 THz EIO because of its precision and moderate cost compared with other manufacturing methods such as high speed micro machining, Deep Reactive Ion Etching (DRIE) or Ultra Violet Lithographie, Galvanik, and Abformung (UV LIGA).