Characterisation of a laser plasma accelerator x-ray source size using a Kirkpatrick-Baez microscope

Shahzad, Mohammed and Reid, Lewis R. and Spesyvtsev, Roman and Maitrallain, Antoine and Holt, George K. and Li, Wentao and Vieux, Gregory and Brunetti, Enrico and Wiggins, Samuel M. and Gatti, Giancarlo and Luis, D De and Volpe, Luca and Fedosejevs, Robert and Jaroszynski, Dino A. (2019) Characterisation of a laser plasma accelerator x-ray source size using a Kirkpatrick-Baez microscope. In: SPIE Optics + Optoelectronics. SPIE, Bellingham, W.A..

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    Abstract

    Laser plasma accelerators are highly versatile and are sources of both radiation and particle beams, with uniqueproperties. The Scottish Centre for Application based Plasma Accelerators (SCAPA)140 TW and 350 TW laserat the University of Strathclyde has been used to produce both soft and hard x-rays using a laser wakefieldaccelerator (LWFA). The inherent characteristics of these femtosecond duration pulsed x-rays make them idealfor probing matter and ultrafast imaging applications. To support the development of applications of laserplasma accelerators at the SCAPA facility an adjustable Kirkpatrick-Baez x-ray microscope has been designedto focus 50 eV - 10 KeV x-rays. It is now possible to produce high quality flat silicon wafers substrates that can beused for x-ray optics. Platinum-coated (40 nm) silicon wafers have been used in the KB instrument to image theLWFA x-ray source. We simulate the source distribution as part of an investigation to determine the x-ray sourcesize and therefore its transverse coherence and ultimately the peak brilliance. The OASYS SHAODOW-OUIraytracing and wave propagation code has been used to simulate the imaging setup and determine instrumentresolution.