Characterisation of a laser plasma accelerator x-ray source size using a Kirkpatrick-Baez microscope

Shahzad, Mohammed and Reid, Lewis R. and Spesyvtsev, Roman and Maitrallain, Antoine and Holt, George K. and Li, Wentao and Vieux, Gregory and Brunetti, Enrico and Wiggins, Samuel M. and Gatti, Giancarlo and Luis, D De and Volpe, Luca and Fedosejevs, Robert and Jaroszynski, Dino A. (2019) Characterisation of a laser plasma accelerator x-ray source size using a Kirkpatrick-Baez microscope. In: SPIE Optics + Optoelectronics. SPIE, Bellingham, W.A.. ISBN 9781510627383

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    Abstract

    Laser plasma accelerators are highly versatile and are sources of both radiation and particle beams, with unique properties. The Scottish Centre for Application based Plasma Accelerators (SCAPA) 40 TW and 350 TW laser at the University of Strathclyde has been used to produce both soft and hard x-rays using a laser wakefield accelerator (LWFA). The inherent characteristics of these femtosecond duration pulsed x-rays make them ideal for probing matter and ultrafast imaging applications. To support the development of applications of laser plasma accelerators at the SCAPA facility an adjustable Kirkpatrick-Baez x-ray microscope has been designed to focus 50 eV - 10 KeV x-rays. It is now possible to produce high quality at silicon wafers substrates that can be used for x-ray optics. Platinum-coated (40 nm) silicon wafers have been used in the KB instrument to image the LWFA x-ray source. We simulate the source distribution as part of an investigation to determine the x-ray source size and therefore its transverse coherence and ultimately the peak brilliance. The OASYS SHAODOW-OUI raytracing and wave propagation code has been used to simulate the imaging setup and determine instrument resolution.