1.9 µm waveguide laser fabricated by ultrafast laser inscription in Tm : Lu2O3 ceramic

Morris, J. and Stevenson, N. K. and Bookey, H. T. and Kar, A. K. and Brown, C. T.A. and Hopkins, J. M. and Dawson, M. D. and Lagatsky, A.A. (2017) 1.9 µm waveguide laser fabricated by ultrafast laser inscription in Tm : Lu2O3 ceramic. Optics Express, 25 (13). pp. 14910-14917. ISSN 1094-4087 (https://doi.org/10.1364/OE.25.014910)

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Abstract

The ultrafast laser inscription technique has been used to fabricate channel waveguides in Tm3+-doped Lu2O3 ceramic gain medium for the first time to our knowledge. Laser operation has been demonstrated using a monolithic microchip cavity with a continuous-wave Ti: sapphire pump source at 796 nm. The maximum output power achieved from the Tm: Lu2O3 waveguide laser was 81 mW at 1942 nm. A maximum slope efficiency of 9.5% was measured with the laser thresholds observed to be in the range of 50-200 mW of absorbed pump power. Propagation losses for this waveguide structure are calculated to be 0.7 dBcm-1 ± 0.3 dBcm-1 at the lasing wavelength.