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http://dx.doi.org/10.1088/1367-2630/17/10/103026
Raman backscattering saturation due to coupling between ωp and 2ωp modes in plasma
G Raj
B Ersfeld
G Vieux
S Yoffe
Min Sup Hur
R A Cairns
D A Jaroszynski
IOP Publishing
Raman amplification in plasma
saturation of parametric processes in plasma
plasma-based amplifiers
52.35.Mw
42.65.Dr
52.38.Kd
52.65.Rr
New Journal of Physics, 17(2015) 103026. doi:10.1088/1367-2630/17/10/103026
10.1088/1367-2630/17/10/103026
http://dx.doi.org/10.1088/1367-2630/17/10/103026
journal
New Journal of Physics
© 2015 IOP Publishing Ltd and Deutsche Physikalische Gesellschaft
1367-2630
17
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2015-10-14
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2015-10-16T16:17:20+01:00
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Raman amplification in plasma; saturation of parametric processes in plasma; plasma-based amplifiers; 52.35.Mw; 42.65.Dr; 52.38.Kd; 52.65.Rr
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