Comparison of dark and light-induced annealing of metastable defects in a-Si:H

Gleskova, Helena and Nakata, M. and Wagner, S.; Hack, M. and Madan, A. and Matsuda, A. and Powell, M. and Schiff, E. A., eds. (1994) Comparison of dark and light-induced annealing of metastable defects in a-Si:H. In: Amorphous silicon technology - 1994. MRS Symposium Proceedings, 336 . Materials Research Society, USA, pp. 245-250. ISBN 9781558992368

Abstract

This chapter looks at a comparison of dark and light-induced annealing of metastable defects in a-Si:H

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• Item metadata

  Item type:	Book Section
  ID code:	33441
  Dates:	Date Event 4 November 1994 Published
  Subjects:	Technology > Electrical engineering. Electronics Nuclear engineering
  Department:	Faculty of Engineering > Electronic and Electrical Engineering
  Depositing user:	Pure Administrator
  Date deposited:	04 Nov 2011 16:30
  Last modified:	08 Apr 2024 12:47
  URI:	https://strathprints.strath.ac.uk/id/eprint/33441