Electrophotographic patterning of thin-film circuits
Gleskova, Helena (2000) Electrophotographic patterning of thin-film circuits. US6080606.
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Amorphous silicon thin-film transistors on glass foil are made using exclusively electrophotographic printing for pattern formation, contact hole opening, and device isolation. Toner etch masks are applied by feeding the glass substrate through a laser printer or photocopier, or from laser-printed patterns on transfer paper. This all-printed patterning is a low-cost, large-area circuit processing technology, suitable for producing backplanes for active matrix liquid crystal displays.
ORCID iDs
Gleskova, Helena ORCID: https://orcid.org/0000-0001-7195-9639, Shen, D. and Wagner, S.;-
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Item type: Patent ID code: 33404 Dates: DateEvent27 June 2000PublishedKeywords: electrophotographic patterning , thin-film circuits, Electrical Engineering. Electronics Nuclear Engineering Subjects: Technology > Electrical engineering. Electronics Nuclear engineering Department: Faculty of Engineering > Electronic and Electrical Engineering Depositing user: Pure Administrator Date deposited: 23 Nov 2011 16:40 Last modified: 18 Jan 2023 12:05 URI: https://strathprints.strath.ac.uk/id/eprint/33404
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