Jeon, C.W. and Gu, E. and Dawson, M.D. (2005) Mask-free photolithographic exposure using a matrix-addressable micropixellated AllnGaN ultraviolet light-emitting diode. Applied Physics Letters, 86 (221105). ISSN 0003-6951
Full text not available in this repository. (Request a copy from the Strathclyde author)Abstract
We report the integration of a UV-curable polymer microlens array onto a matrix-addressable, 368-nm-wavelength, light-emitting diode device containing 64×64 micropixel elements. The geometrical and optical parameters of the microlenses were carefully chosen to allow the highly divergent emission from each micropixel to be collimated into a narrow beam of about 8-µm diam, over a distance of more than 500 µm. This device is demonstrated as a photolithographic exposure tool, where the pattern-programmable array plays the role both of light source and photomask. A simple pattern comprised of two disks having 16-µm diam and 30-µm spacing was transferred into an i-line photoresist.
| Item type: | Article |
|---|---|
| ID code: | 5267 |
| Keywords: | aluminium compounds, indium compounds, gallium compounds, semiconductors, light emitting diodes, microlenses, optical polymers, etching, photonics, optics, Optics. Light |
| Subjects: | Science > Physics > Optics. Light |
| Department: | Faculty of Science > Institute of Photonics |
| Related URLs: | |
| Depositing user: | Strathprints Administrator |
| Date Deposited: | 31 Jan 2008 |
| Last modified: | 12 Mar 2012 10:42 |
| URI: | http://strathprints.strath.ac.uk/id/eprint/5267 |
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