Choi, H.W. and Jeon, C.W. and Dawson, M.D. (2004) Fabrication of matrix-addressable micro-LED arrays based on a novel etch technique. Journal of Crystal Growth, 268 (3-4). pp. 527-530. ISSN 0022-0248Full text not available in this repository. Request a copy from the Strathclyde author
A novel method of etching which allows the direct interconnection of multiple GaN-based devices is introduced. The mesa structures of devices are etched using an isotropic recipe which produces tapered sidewalls. The extent of inclination can be readily controlled through various etching parameters, which include the ICP power, plate power and pressure, thus modifying the vertical and lateral etch components. This approach has been successfully adopted in the fabrication of interconnect and matrix-addressable micro-LEDs, which offer superior optical and electrical performance and a high degree of uniformity compared to similar devices fabricated using conventional processes.
|Keywords:||etching, nitrides, light emitting diodes, microdisplays, Optics. Light, Materials Chemistry, Inorganic Chemistry, Condensed Matter Physics|
|Subjects:||Science > Physics > Optics. Light|
|Department:||Faculty of Science > Physics > Institute of Photonics|
|Depositing user:||Strathprints Administrator|
|Date Deposited:||29 Jan 2008|
|Last modified:||22 Mar 2017 09:39|