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Resonant wavelength control of a 1.3um microcavity by intracavity steam oxidation

Macaluso, R. and Robert, F. and Bryce, A.C. and Calvez, S. and Dawson, M.D. (2003) Resonant wavelength control of a 1.3um microcavity by intracavity steam oxidation. Semiconductor Science and Technology, 18 (2). L12-L15. ISSN 0268-1242

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Abstract

We report a multi-wavelength passive filter working in the 1.3 μm range, fabricated by a post-growth technique based on the combined lateral-vertical steam oxidation of AlGaAs layers within a microcavity. Wafers are photolithographically patterned and etched through the top to create mesa structures which are oxidized from both edges, and control of resonant wavelength is achieved through mesa width, thickness and compositional control of intracavity layers to be oxidized, and oxidation conditions. Microreflectivity measurements of the processed devices show that in this wavelength range it is possible using this approach to control the resonant wavelength over a range of about 52 nm.

Item type: Article
ID code: 5236
Keywords: wavelength tuning, semiconductors, optical microcavity, Optics. Light, Electrical engineering. Electronics Nuclear engineering, Materials Chemistry, Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering, Condensed Matter Physics
Subjects: Science > Physics > Optics. Light
Technology > Electrical engineering. Electronics Nuclear engineering
Department: Faculty of Science > Institute of Photonics
Related URLs:
    Depositing user: Strathprints Administrator
    Date Deposited: 25 Jan 2008
    Last modified: 04 Sep 2014 15:37
    URI: http://strathprints.strath.ac.uk/id/eprint/5236

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