Macaluso, R. and Robert, F. and Bryce, A.C. and Calvez, S. and Dawson, M.D. (2003) Resonant wavelength control of a 1.3um microcavity by intracavity steam oxidation. Semiconductor Science and Technology, 18 (2). L12-L15. ISSN 0268-1242
Full text not available in this repository. (Request a copy from the Strathclyde author)Abstract
We report a multi-wavelength passive filter working in the 1.3 μm range, fabricated by a post-growth technique based on the combined lateral-vertical steam oxidation of AlGaAs layers within a microcavity. Wafers are photolithographically patterned and etched through the top to create mesa structures which are oxidized from both edges, and control of resonant wavelength is achieved through mesa width, thickness and compositional control of intracavity layers to be oxidized, and oxidation conditions. Microreflectivity measurements of the processed devices show that in this wavelength range it is possible using this approach to control the resonant wavelength over a range of about 52 nm.
| Item type: | Article |
|---|---|
| ID code: | 5236 |
| Keywords: | wavelength tuning, semiconductors, optical microcavity, Optics. Light, Electrical engineering. Electronics Nuclear engineering |
| Subjects: | Science > Physics > Optics. Light Technology > Electrical engineering. Electronics Nuclear engineering |
| Department: | Faculty of Science > Institute of Photonics |
| Related URLs: | |
| Depositing user: | Strathprints Administrator |
| Date Deposited: | 25 Jan 2008 |
| Last modified: | 12 Mar 2012 10:42 |
| URI: | http://strathprints.strath.ac.uk/id/eprint/5236 |
Actions (login required)
| View Item |