Strathprints Home | Open Access | Browse | Search | User area | Copyright | Help | Library Home | SUPrimo

Anatase thin films on glass from the chemical vapor deposition of titanium(IV) chloride and ethyl acetate

O'Neill, S.A. and Clark, R.J.H. and Parkin, I.P. and Elliott, N. and Mills, A. (2003) Anatase thin films on glass from the chemical vapor deposition of titanium(IV) chloride and ethyl acetate. Chemistry of Materials, 15 (1). pp. 46-50. ISSN 0897-4756

Full text not available in this repository. (Request a copy from the Strathclyde author)

Abstract

Thin (50-500 nm) films of TiO2 may be deposited on glass substrates by the atmospheric pressure chemical vapor deposition (APCVD) reaction of TiCl4 with ethyl acetate at 400600 C. The TiO2 films are exclusively in the form of anatase, as established by Raman microscopy and glancing angle X-ray diffraction. X-ray photoelectron spectroscopy gave a 1:2 Ti:O ratio with Ti 2P(3/2) at 458.6 eV and O 1s is at 530.6 eV. The water droplet contact angle drops from 60degrees to <5degrees on UV irradiation. The deposited films bring about the: complete photooxidation of a stearic acid overlayer following irradiation at 254 nm for 30 min. Both the drop in contact angle and the photooxidation described are critically important to the self-cleaning applications of anatase films on glass.

Item type: Article
ID code: 424
Keywords: SEMICONDUCTOR PHOTOCATALYSIS, TIO2, GROWTH, WATER, Chemistry, Materials Chemistry, Chemical Engineering(all), Chemistry(all)
Subjects: Science > Chemistry
Department: Faculty of Science > Pure and Applied Chemistry
Related URLs:
Depositing user: Mr Derek Boyle
Date Deposited: 10 Mar 2006
Last modified: 04 Sep 2014 11:48
URI: http://strathprints.strath.ac.uk/id/eprint/424

Actions (login required)

View Item