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One-step lithography for fabrication of a hybrid microlens array using a coding grey-level mask

Yao, J. and Uttamchandani, D.G. and Zhang, Y. and Guo, Y. and Cui, Z. (2002) One-step lithography for fabrication of a hybrid microlens array using a coding grey-level mask. In: Conference on MEMS/MOEMS - Advances in Photonic Communications, Sensing, Metrology, Packaging and Assembly, 2002-10-28 - 2002-10-29.

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Abstract

Aiming at correcting chromatic aberrations in a far-infrared band, the fabrication of a hybrid microlens array with one-step lithography is proposed, by using a coding grey-level mask. The designed hybrid microlens consists of a refractive rnicrolens and a diffractive microlens in physics. Its structure parameters, in order to achieve the best correction of chromatic aberrations, are evaluated and optimized with the software OSLO to design the layout the grey-level mask. Based on the theory of partial coherent light, the photoresist exposure model and development model, the profile of hybrid microlens in the photoresist have been simulated, the nonlinear errors in the lithography process can be pre-compensated by correcting the mask design. A hybrid microlens array is fabricated through use of the designed mask.