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Strathprints serves world leading Open Access research by the University of Strathclyde, including research by the Strathclyde Institute of Pharmacy and Biomedical Sciences (SIPBS), where research centres such as the Industrial Biotechnology Innovation Centre (IBioIC), the Cancer Research UK Formulation Unit, SeaBioTech and the Centre for Biophotonics are based.

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Low-temperature silicon nitride for thin-film electronics on polyimide foil substrates

Gleskova, H. and Wagner, S. and Gašparík, V. and Kováč, P. (2001) Low-temperature silicon nitride for thin-film electronics on polyimide foil substrates. Applied Surface Science, 175-176. pp. 12-16. ISSN 0169-4332

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Abstract

We optimized silicon nitride (SiN x) layers, deposited by 13.56 MHz plasma enhanced chemical vapor deposition (PECVD) at 150°C, to provide a high quality gate dielectric layer for the amorphous silicon thin film technology on polyimide foils. The layers were deposited from mixtures of silane, ammonia, and hydrogen. We varied the H 2 flow rate from 55 to 220 sccm and the rf power from 5 to 50 W, while the pressure was kept at 500 mTorr and the ratio of ammonia to silane flow at 10:1. The best film was obtained from the gas composition of SiH 4:NH 3:H 2 = 1:10:44 and the rf power of ∼20 W. This film grows at the rate of 1.5 Å/s, has a refractive index n = 1.80, a dielectric constant ε = 7.46, a dielectric breakdown field >3.4 MV/cm, a Si/N ratio of ∼0.67, and a hydrogen content of ∼2 × 10 22cm -3, and etches in 10:1 buffered HF at a rate of 61 Å/s.