Gleskova, Helena and Wagner, S. (2001) Electrical stability of a-Si:H TFTs fabricated at 150ºC. In: Amorphous and heterogeneous silicon-based films – 2001. MRS Symposium Proceedings, 664 . Materials Research Society, Warrendale, PA, A19.7.1-A19.7.6. ISBN 9781558996007
Full text not available in this repository. (Request a copy from the Strathclyde author)Abstract
This chapter looks at electrical stability of a-Si:H TFTs fabricated at 150ºC
| Item type: | Book Section |
|---|---|
| ID code: | 33430 |
| Keywords: | electrical stability, si:h tft , fabricated, 150-degrees-C, Electrical engineering. Electronics Nuclear engineering |
| Subjects: | Technology > Electrical engineering. Electronics Nuclear engineering |
| Department: | Faculty of Engineering > Electronic and Electrical Engineering |
| Related URLs: | |
| Depositing user: | Pure Administrator |
| Date Deposited: | 04 Nov 2011 14:56 |
| Last modified: | 04 Oct 2012 16:33 |
| URI: | http://strathprints.strath.ac.uk/id/eprint/33430 |
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