Electrical stability of a-Si:H TFTs fabricated at 150ºC

Gleskova, Helena and Wagner, S.; Stutzmann, M. and Boyce, J. B. and Cohen, J. D. and Collins, R. W. and Hanna, J., eds. (2001) Electrical stability of a-Si:H TFTs fabricated at 150ºC. In: Amorphous and heterogeneous silicon-based films – 2001. MRS Symposium Proceedings, 664 . Materials Research Society, USA, A19.7.1-A19.7.6. ISBN 9781558996007

Abstract

This chapter looks at electrical stability of a-Si:H TFTs fabricated at 150ºC

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• Item metadata

  Item type:	Book Section
  ID code:	33430
  Dates:	Date Event 15 October 2001 Published
  Subjects:	Technology > Electrical engineering. Electronics Nuclear engineering
  Department:	Faculty of Engineering > Electronic and Electrical Engineering
  Depositing user:	Pure Administrator
  Date deposited:	04 Nov 2011 14:56
  Last modified:	08 Apr 2024 12:47
  URI:	https://strathprints.strath.ac.uk/id/eprint/33430