Gleskova, Helena and Morin, P. A. and Wagner, S. (1993) Kinetics of recovery of the light-induced defects in hydrogenated amorphous silicon under illumination. Applied Physics Letters, 62 (17). pp. 2063-2065. ISSN 0003-6951
Full text not available in this repository. (Request a copy from the Strathclyde author)Official URL: http://dx.doi.org/10.1063/1.109480
Abstract
The results of a study of the kinetics of the light‐induced annealing of defects in hydrogenated amorphous silicon (a‐Si:H) are presented. Our results show that at temperatures between 92 and 152 °C illumination increases the rate of annealing compared to annealing in the dark. The rates of annealing in the dark and under illumination exhibit the same functional dependence on the defect density. This observation suggests that the mechanisms for ‘‘dark’’ and ‘‘light’’ annealing are identical.
| Item type: | Article |
|---|---|
| ID code: | 33421 |
| Keywords: | amorphous state, annealing , hydrogen additions, kinetics, Electrical engineering. Electronics Nuclear engineering |
| Subjects: | Technology > Electrical engineering. Electronics Nuclear engineering |
| Department: | Faculty of Engineering > Electronic and Electrical Engineering |
| Related URLs: | |
| Depositing user: | Pure Administrator |
| Date Deposited: | 13 Oct 2011 14:41 |
| Last modified: | 04 Oct 2012 13:52 |
| URI: | http://strathprints.strath.ac.uk/id/eprint/33421 |
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