Gleskova, H. and Morin, P. A. and Wagner, S. (1993) Kinetics of recovery of the light-induced defects in hydrogenated amorphous silicon under illumination. Applied Physics Letters, 62 (17). pp. 2063-2065. ISSN 0003-6951Full text not available in this repository. Request a copy from the Strathclyde author
The results of a study of the kinetics of the light‐induced annealing of defects in hydrogenated amorphous silicon (a‐Si:H) are presented. Our results show that at temperatures between 92 and 152 °C illumination increases the rate of annealing compared to annealing in the dark. The rates of annealing in the dark and under illumination exhibit the same functional dependence on the defect density. This observation suggests that the mechanisms for ‘‘dark’’ and ‘‘light’’ annealing are identical.
|Keywords:||amorphous state, annealing , hydrogen additions, kinetics, Electrical engineering. Electronics Nuclear engineering, Physics and Astronomy (miscellaneous)|
|Subjects:||Technology > Electrical engineering. Electronics Nuclear engineering|
|Department:||Faculty of Engineering > Electronic and Electrical Engineering|
|Depositing user:||Pure Administrator|
|Date Deposited:||13 Oct 2011 13:41|
|Last modified:||22 Mar 2017 11:36|