Andersen, O. and Peaker, A.R. and Dobaczewski, L. and Bonde Nielsen, K. and Hourahine, B. and Jones, R. and Briddon, P.R. and Öberg, S. (2002) Electrical activity of carbon-hydrogen centers in Si. Physical Review B: Condensed Matter and Materials Physics, 66 (23). pp. 235205-1. ISSN 1098-0121
The electrical activity of Cs-H defects in Si has been investigated in a combined modeling and experimental study. High-resolution Laplace capacitance spectroscopy with the uniaxial stress technique has been used to measure the stress-energy tensor and the results are compared with theoretical modeling. At low temperatures, implanted H is trapped as a negative-U center with a donor level in the upper half of the gap. However, at higher temperatures, H migrates closer to the carbon impurity and the donor level falls, crossing the gap. At the same time, an acceptor level is introduced into the upper gap making the defect a positive-U center.
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