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Novel vinyl ether functionalized fluorene polymers for active incorporation into common photoresist matrices

Kuehne, A.J.C. and Mackintosh, A.R. and Pethrick, R.A. and Tieke, B. (2008) Novel vinyl ether functionalized fluorene polymers for active incorporation into common photoresist matrices. Tetrahedron Letters, 49 (32). pp. 4722-4724. ISSN 0040-4039

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Abstract

A novel vinyl ether functionalized fluorene monomer was prepared to produce a series of fluorene-based polymers with different emitter units to cover emission in the visible spectrum whilst retaining the same main absorption profile. The vinyl ether functionality allows for active incorporation of the light emitting polymers into standard vinyl ether and glycidyl ether photoresist materials. This enables photopatterning of light emitting structures for application in UV down-conversion, waveguiding and for lasing media.