Picture of a black hole

Strathclyde Open Access research that creates ripples...

The Strathprints institutional repository is a digital archive of University of Strathclyde's Open Access research outputs. Strathprints provides access to thousands of research papers by University of Strathclyde researchers, including by Strathclyde physicists involved in observing gravitational waves and black hole mergers as part of the Laser Interferometer Gravitational-Wave Observatory (LIGO) - but also other internationally significant research from the Department of Physics. Discover why Strathclyde's physics research is making ripples...

Strathprints also exposes world leading research from the Faculties of Science, Engineering, Humanities & Social Sciences, and from the Strathclyde Business School.

Discover more...

Maskless ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes

Elfstrom, D. and Guilhabert, B.J.E. and McKendry, J. and Poland, S.P. and Gong, Z. and Massoubre, D. and Valentine, G.J. and Gu, E. and Dawson, M.D. and Richardson, E. and Rae, B.R. and Blanco-Gomez, G. and Cooper, J.M. and Henderson, R.K. (2009) Maskless ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes. Optics Express, 17 (26). pp. 23522-23529. ISSN 1094-4087

Full text not available in this repository. (Request a copy from the Strathclyde author)

Abstract

We report on an approach to ultraviolet (UV) photolithography and direct writing where both the exposure pattern and dose are determined by a complementary metal oxide semiconductor (CMOS) controlled micro-pixellated light emitting diode array. The 370 nm UV light from a demonstrator 8 x 8 gallium nitride micro-pixel LED is projected onto photoresist covered substrates using two back-to-back microscope objectives, allowing controlled demagnification. In the present setup, the system is capable of delivering up to 8.8 W/cm2 per imaged pixel in circular spots of diameter approximately 8 microm. We show example structures written in positive as well as in negative photoresist.