Dunn, Gavin and Wilson, S.K. and Duffy, B.R. and Sefiane, K. (2009) Evaporation of a thin droplet on a thin substrate with a high thermal resistance. Physics of Fluids, 21. 052101. ISSN 10706631

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Abstract
A mathematical model for the quasisteady evaporation of a thin liquid droplet on a thin substrate that incorporates the dependence of the saturation concentration of vapour at the free surface of the droplet on temperature is used to examine an atypical situation in which the substrate has a high thermal resistance relative to the droplet (i.e. it is highly insulating and/or is thick relative to the droplet). In this situation diffusion of heat through the substrate is the ratelimiting evaporative process and at leading order the local mass flux is spatially uniform, the total evaporation rate is proportional to the surface area of the droplet, and the droplet is uniformly cooled. In particular, the qualitative differences between the predictions of the present model in this situation and those of the widely used 'basic' model in which the saturation concentration is independent of temperature are highlighted.
Item type:  Article 

ID code:  14244 
Keywords:  quasisteady evaporation, thin droplet, mathematical model, substrate, Mathematics 
Subjects:  Science > Mathematics 
Department:  Faculty of Science > Mathematics and Statistics > Mathematics Faculty of Science > Mathematics and Statistics 
Depositing user:  Mrs Mary McAuley 
Date Deposited:  21 Jan 2010 18:54 
Last modified:  15 Apr 2015 09:41 
Related URLs:  
URI:  http://strathprints.strath.ac.uk/id/eprint/14244 
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