Strathprints Home | Open Access | Browse | Search | User area | Copyright | Help | Library Home | SUPrimo

Design and characterization of a radio frequency MEMS inductor using silicon MEMS foundry process

Li, L. and Uttamchandani, D.G. (2008) Design and characterization of a radio frequency MEMS inductor using silicon MEMS foundry process. In: PIERS 2008 Hangzhou: Progress in Electromagnetics Research Symposium. Progress in Electromagnetics Research Symposium . The Electromagnetics Academy, pp. 925-928. ISBN 978-1-934142-00-4

Full text not available in this repository. (Request a copy from the Strathclyde author)

Abstract

A successful design of RF inductor based on a silicon MEMS foundry process is presented. The suspended inductor has been realized in electroplated thick nickel with front side bulk micromachining of the substrate. The overall size of the inductor is about 1 mm x 1 mm. The inductors have been experimentally characterized and inductances around 2 nH in the frequency range of 200 MHz-7 GHz have been measured with self resonant frequency of 9.8 GHz. The peak measured value of the Q factor is 12 at a frequency of 4 GHz. After de-embedding, the Q factor reaches 13 at a frequency of 4.8 GHz. Simulation based on a parameter extraction method has been carried out for the inductor. There is a good agreement between simulated and experimental results.

Item type: Book Section
ID code: 12820
Keywords: radio frequency inductors, radio frequency, MEMS, Electrical engineering. Electronics Nuclear engineering
Subjects: Technology > Electrical engineering. Electronics Nuclear engineering
Department: Faculty of Engineering > Electronic and Electrical Engineering
Related URLs:
Depositing user: Strathprints Administrator
Date Deposited: 17 Aug 2010 11:54
Last modified: 17 Jul 2013 13:23
URI: http://strathprints.strath.ac.uk/id/eprint/12820

Actions (login required)

View Item